[17p-Z16-1~8] 7.2 Applications and technologies of electron beams

△ [17p-Z16-8] INVESTIGATION OF NON-CHARGING EXPOSURE CONDITIONS FOR INSULATING RESIST FILMS IN ELECTRON BEAM LITHOGRAPHY

〇(M1)Kentaro Kojima¹, Kento Kubo¹, Yoshinobu Kono¹, Masatoshi Kotera¹ (1.OIT)

Keywords:Electron beam

The charging phenomenon of an insulating resist in electron beam (EB) lithography has a great influence on its patterning accuracy. The purpose of this research is to systematize the uncharged conditions in EB lithography. In this study, in addition to the results we have published so far, we have found two exposure quantity conditions in which the surface is hardly charged with three different film thicknesses. We also devised a model to explain the charging mechanism. In the presentation, based on this model, "property of M-shaped and W-shaped surface potential distribution observed under uncharged exposure conditions", "resist film thickness dependence", and "change in surface potential with elapsed time" will be explained in detail.