The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

[17p-Z28-1~14] 15.3 III-V-group epitaxial crystals, Fundamentals of epitaxy

Wed. Mar 17, 2021 1:30 PM - 6:00 PM Z28 (Z28)

Nobuhiko Ozaki(Wakayama Univ.), Toshiyuki Kaizu(Kobe Univ.), Yoriko Tominaga(Hiroshima Univ.), Kentaro Onabe

4:15 PM - 4:30 PM

[17p-Z28-9] MBE Growth of QD Lasers on Multi-Functional Metamorphic Buffer Layer

JINKWAN KWOEN1, Imoto Takaya1, Yasuhiko Arakawa1 (1.NanoQuine, Univ. of Tokyo)

Keywords:quantum dot, molecular beam epitaxy, quantum dot laser

In order to manufacture an optical device with industrial meaning, it is necessary to fabricate a device that meets the technical demand on commercially available substrates. Therefore, the approach of the metamorphic layer has attracted attention in the field of crystal growth. However, in the metamorphic layer, crystal defects occur due to lattice mismatch, which reduces device performance and lifetime. In addition, since an additional metamorphic layer is required as compared with a general lattice matched layer, the time cost and the material cost are increased at the same time.
In this paper, we have grown the quantum dot (QD) laser structure on the multi-functional metamorphic buffer (MFMB) layer , which has the three functions of crystal lattice expansion, laser cladding, and threading dislocation filter at the same time. We also have demonstrated laser oscillation by solving the problems of crystal defects and thickening of the existing metamorphic layer.