1200X review function of EUV mask blank inspection systems

Kiwamu TAKEHISA; Tomohiro Suzuki; Hiroki Miyai; Haruhiko Kusunose

Presentation information

Symposium (Oral)

Symposium » Progresses and future on EUV and soft x-ray imaging techniques

[18p-Z03-1~10] Progresses and future on EUV and soft x-ray imaging techniques

Thu. Mar 18, 2021 2:30 PM - 6:35 PM Z03 (Z03)

Mitsunori Toyoda(Tokyo Polytechnic Univ.), Toshihide Tsuru(Yamagata Univ.), Tetsuo Harada(Univ. of Hyogo), Ohigashi Takuji(IMS)

4:35 PM - 5:05 PM

[18p-Z03-6] 1200X review function of EUV mask blank inspection systems

〇Kiwamu TAKEHISA¹, Tomohiro Suzuki¹, Hiroki Miyai¹, Haruhiko Kusunose¹ (1.Lasertec Corp.)

Keywords:EUV, photo mask, blanks

We have been commercializing actinic inspection systems for EUV mask blanks. The systems have a 1200 magnification review function in order to accurately measure the size and the location of the detected defects. The optics the review function and its effects will be explained at the conference.