The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-Z24-1~14] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Thu. Mar 18, 2021 1:30 PM - 5:15 PM Z24 (Z24)

Seiichiro Higashi(Hiroshima Univ.), Tatsuya Okada(Univ. of the Ryukyus)

3:00 PM - 3:15 PM

[18p-Z24-7] Characteristics of Millisecond Solid Phase Crystallization of Phosphorus Doped Silicon Film Annealed by Thermal-Plasma-Jet Irradiation

〇(D)Nguyen ThiKhanh Hoa1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)

Keywords:millisecond solid phase crystallization, micro thermal-plasma-jet