[19a-P04-1~9] 8 Plasma Electronics(Poster)

[19a-P04-8] Low temperature synthesis and physicochemical characterization of Al₂O₃ thin films formed by oxygen plasma irradiation on Al(CH₃)₃ condensed layer.

〇(M2)Atsuki Okawa¹, Daichi Yamada², Yohei Otani², Tetsuya Sato¹ (1.Yamanashi Univ., 2.Suwa Univ. of Sci)

Keywords:semiconductor, trimethylaluminium, Low temperature