Yuya Asamoto

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Speaker, Author, Co-Author

Fri. Sep 23, 2022 9:00 AM - 11:45 AM B101 (B101)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

9:45 AM - 10:00 AM

△ [23a-B101-4] Maximization of Nitrogen Radical Flux for High Through-Put Deposition of Boron Nitride Films with Controlled Bonding States

〇Yuya Asamoto^1,5, Takashi Hamano^1,5, Takayuki Matsuda¹, Masao Noma², Shigehiko Hasegawa³, Michiru Yamashita⁴, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ., 2.Shinko Seiki Co., Ltd., 3.Osaka Univ., 4.Hyogo Pref. Inst. Technol., 5.JSPS Research Fellow)

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