09:00 〜 09:15 ▲ [22a-B102-1] Investigation on threading dislocation reduction in CdTe/Si epitaxial layer using post-growth patterning and annealing technique 〇Bal Singh Chaudhari1、Yutaka Takagi1、Ryo Okumura1、Madan Niraula1 (1.NITech)