9:00 AM - 9:15 AM ▲ [22a-B102-1] Investigation on threading dislocation reduction in CdTe/Si epitaxial layer using post-growth patterning and annealing technique 〇Bal Singh Chaudhari1, Yutaka Takagi1, Ryo Okumura1, Madan Niraula1 (1.NITech)