5:15 PM - 5:30 PM
△ [20p-C401-14] SiGe Quantum-Dot Formation in Si-Oxide Film using Double Si+/Ge+ Hot Ion Implantation
〇Koki Murakawa1, Takashi Aoki1, Toshiyuki Samejima2, Tomohisa Mizuno1 (1.Kanagawa Univ., 2.Tokyo Univ. Agri. Tech.)
Koki Murakawa
Speaker, Author, Co-Author
Tue. Sep 20, 2022 1:30 PM - 6:00 PM C401 (C401)
- Oral presentation
- | 13 Semiconductors
- | 13.6 Nanostructures, quantum phenomena, and nano quantum devices