Keigo Naito

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Speaker, Author, Co-Author

Wed. Sep 21, 2022 4:00 PM - 6:00 PM P15 (Arena)

Poster presentation
| 6 Thin Films and Surfaces
| 6.1 Ferroelectric thin films

[21p-P15-1~6] 6.1 Ferroelectric thin films

4:00 PM - 6:00 PM

[21p-P15-3] Crystallization process of ALD deposited Hf_xZr_1-xO₂ thin films on Ga₂O₃ substrate.

〇Keigo Naito¹, Koichi Yamaguchi², Takeshi Yoshimura¹, Norifumi Fujimura¹ (1.Osaka Met. Univ., 2.Osaka Pref. Univ.)