Hiroharu Kawasaki

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Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:45 PM - 5:00 PM

[22p-A406-15] Preparation of the gradient element functional thin films of Fe, Ti by sputtering deposition method using powder mixture targets

〇Hiroharu Kawasaki¹, Tamiko Ohshima¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Yusuke Hibino¹, Takeshi Satake^1,2, Shin-ichi Aoqui² (1.Nai'l Ins. Tech. Sasebo Col., 2.Sojo Univ.)

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