Hibiki Kato

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Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:15 PM - 2:30 PM

[22p-A406-6] Ultra-fast Etching of Photo resist by Reactive Atmospheric-pressure Thermal Plasma Jet

〇(M2)Hibiki Kato¹, Hiroaki Hanafusa¹, Takuma Sato¹, Seiichirou Higashi¹ (1.Graduate School of Advanced Science and Engineering, Hiroshima Univ.)