Yuto Seki

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Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:00 PM - 5:00 PM A406 (A406)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-A406-1~15] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:30 PM - 2:45 PM

[22p-A406-7] Influence of pulse operation on ionic composition in a dual-frequency capacitively-coupled Ar/C₄F₈/O₂ plasma

〇Yuto Seki¹, Haruhito Kato¹, Shuichi Kuboi¹, Haruka Suzuki^1,2, Hirotaka Toyoda^1,2,3 (1.Nagoya Univ., 2.cLPS, Nagoya Univ., 3.NIFS)