Kentaro Onishi

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Speaker, Author, Co-Author

Thu. Sep 22, 2022 1:30 PM - 6:15 PM B204 (B204)

Oral presentation
| 13 Semiconductors
| 13.7 Compound and power devices, process technology and characterization

[22p-B204-1~18] 13.7 Compound and power devices, process technology and characterization

1:30 PM - 1:45 PM

△ [22p-B204-1] Suppression of a GaO_x layer at SiO₂/GaN MOS Interface by Sputter Deposition of SiO₂

〇(B)Kentaro Onishi¹, Takuma Kobayashi¹, Hidetoshi Mizobata¹, Mikito Nozaki¹, Akitaka Yoshigoe², Takayoshi Shimura¹, Heiji Watanabe¹ (1.Osaka Univ., 2.JAEA)

1:45 PM - 2:00 PM

[22p-B204-2] Suppression of Ga diffusion in SiO₂/GaN Structures Formed by Sputter Deposition of SiO₂

〇(B)Kentaro Onishi¹, Takuma Kobayashi¹, Hidetoshi Mizobata¹, Mikito Nozaki¹, Akitaka Yoshigoe², Takayoshi Shimura¹, Heiji Watanabe¹ (1.Osaka Univ., 2.JAEA)

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