Kentaro Saito

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Speaker, Author, Co-Author

Fri. Sep 23, 2022 9:00 AM - 11:45 AM B101 (B101)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[23a-B101-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:15 AM - 11:30 AM

[23a-B101-9] AlN and Al₂O₃ multiple gas barrier films fabricated by low-temperature atomic layer deposition

〇(D)Kentaro Saito¹, Kazuki Yoshida¹, Masanori Miura², Kensaku Kanomata², Bashir Ahmmad¹, Shigeru Kubota¹, Fumihiko Hirose¹ (1.Yamagata Univ., 2.ROEL Yamagata Univ.)