Takayuki Hagiwara

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Speaker, Author, Co-Author

Fri. Sep 23, 2022 1:15 PM - 5:00 PM C102 (C102)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[23p-C102-1~14] 13.3 Insulator technology

3:15 PM - 3:30 PM

[23p-C102-8] Stress of Al₂O₃ film by ALD using high purity ozone

〇Takayuki Hagiwara¹, Soichiro Motoda¹, Naoto Kameda¹, Ken Nakamura², Hidehiko Nonaka² (1.MEIDEN NPI INC., 2.AIST)