[20a-A200-1~10] 17.3 Layered materials

[20a-A200-5] Investigation of the effect of the thickness and orientation of Mo precursor on the crystal structure of MoS₂ after sulfurization

〇Koki Sato¹, Masato Matsushima¹, Kazuki Takahashi¹, Joonam Kim^1,2 (1.Tokyo Univ. Sci., 2.RIST)

Keywords:Molybdenum disulfide, XRD, Orientation

Molybdenum disulfide (MoS₂) has been reported to have high chemical reactivity at the layer terminations and high mobility in the in-plane direction, and is expected to have applications in H₂ generation catalysts and sensors. In addition, by growing the layers perpendicular to the substrate, the density of active sites on the thin film surface and the mobility in the perpendicular direction are expected to be improved. We have previously reported the effects of orientation and crystallite size of Mo precursors on MoS₂, but there are few reports on the effects of thin film structure, such as film thickness, on the orientation of MoS₂. In this study, we investigated the effect of precursor film thickness on the orientation of MoS₂.