[20a-C101-1~13] 7.3 Micro/Nano patterning and fabrication

[20a-C101-7] Molecular dynamics study of electron beam lithography for negative type resists

〇Kaito Yamada¹, Hirai Yoshihiko², Yasuda Masaaki² (1.Osaka Pref. Univ., 2.Osaka Met. Univ.)

Keywords:Electron Beam Lithography, Molecular Dynamics, resist

We have developed a molecular dynamics simulation of electron beam lithography for negative type resists. For the resist structure prepared by randomly arranging the molecules, the exposure was reproduced by forming a cross-linking bond between the resist molecules in proportion to the absorption energy distribution by the exposure. Development was reproduced by removing a polymer with a certain molecular weight or less from the resist. The pattern shape obtained by the simulation showed a tendency of line edge roughness depending on the exposure dose.