[20p-A105-1~11] 8.1 Plasma production and diagnostics

△ [20p-A105-1] Development of uniformity diagnostic system to be installed on actual plasma CVD/ALD machines

〇(M2)Takaya Ninomiya¹, Haruhiko Himura¹, Akio Sanpei¹, Miharu Niimoto¹, Shinichiro Inagaki¹ (1.Kyoto Institute of Technology)

Keywords:surface wave plasma, double-probe, Optical Measurement

Film formation in PECVD has the problem of non-uniform deposition due to uneven plasma. Therefore, our goal is to solve that problem by FB control with real-time monitoring. We will conduct a verification experiment of a new optical measurement technique to measure plasma distribution by reconstructing camera images taken from one direction. Three microwave-powered surface wave plasmas are generated in a vacuum apparatus that mimics an actual film forming apparatus. We will validate the method by comparing the plasma distribution between the double-probe measurement and a novel optical measurement.