[20p-A105-1~11] 8.1 Plasma production and diagnostics

△ [20p-A105-2] Passive monitoring of specific particle species in 860 MHz surface wave plasma for plasma CVD/ALD

〇Miharu Niimoto¹, Akio Sanpei¹, Haruhiko Himura¹, Takaya Ninomiya¹, Shinichiro Inagaki¹ (1.KIT)

Keywords:spectroscopy, plasma process, image diagnostic

In the plasma process, uniformity of plasma in deposition is required. Therefore, image diagnostic was used as a method to instantaneously obtain a three-dimensional distribution without affecting the plasma. The three-dimensional distribution of the plasma can be obtained by reconstructing an image of the plasma taken from one direction. In this study, we measured plasmas generated by two types of gases for the purpose of acquiring three-dimensional images of ions and radicals that contribute to the process in the gas mixture.