The 83rd JSAP Autumn Meeting 2022

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[20p-A105-1~11] 8.1 Plasma production and diagnostics

Tue. Sep 20, 2022 2:00 PM - 5:00 PM A105 (A105)

Daisuke Ogawa(Chubu Univ.), Kentaro Tomita(Hokkaido Univ.)

3:15 PM - 3:30 PM

[20p-A105-6] Development of array-shaped RF magnetron sputtering source based on a combination of race-track and segment magnetron plasmas for uniform target utilization

〇(M1)Ryunosuke Masunaga1, Yasunori Ohtsu1 (1.Saga Univ.)

Keywords:RF magnetron sputtering, segment magnetron plasmas, uniform target utilization