[21a-C202-1~12] 17.3 Layered materials

△ [21a-C202-8] Fabrication of high-quality Janus TMD by plasma atomic functionalization

〇Soma Aoki¹, Yuta Iwamoto¹, Xing He¹, Toshiro Kaneko¹, Toshiaki Kato¹ (1.Tohoku Univ.)

Keywords:Janus monolayer TMD, 2D material

Janus monolayer transition metal dichalcogenides (Janus monolayer TMDs) , whose upper and lower surfaces are composed of different chalcogen atoms, have attracted much attention because of theoretical predictions of spontaneous polarization and other new properties not found in conventional TMDs. In this study, we investigated the synthesis of Janus monolayer TMDs by selective epitaxy atomic replacement process using mild plasma reaction, optimization of synthesis conditions and clarification of the reaction mechanism to achieve high quality. As a result, we succeeded in synthesizing high-quality Janus TMDs with high PL intensity. The spatial- and time-evolution of the reactions are also revealed by repeatable-plasma treatments.