Water Flow Improved by Side Wall Pinhole Outlets of Silicon Wafer Wet Cleaning Bath

Toko Tsuchida; Toshinori Takahashi; Hitoshi Habuka; Akihiro Goto

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[21a-C206-1~13] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Wed. Sep 21, 2022 9:00 AM - 12:30 PM C206 (C206)

Koichiro Saga(Sony), Nobuya Mori(Osaka Univ.)

9:00 AM - 9:15 AM

[21a-C206-1] Water Flow Improved by Side Wall Pinhole Outlets of Silicon Wafer Wet Cleaning Bath

Toko Tsuchida¹, Toshinori Takahashi¹, 〇Hitoshi Habuka¹, Akihiro Goto² (1.Yokohama Nat. Univ., 2.Pre-Tech)

Keywords:Wafer wet cleaning

The water flow in the silicon wafer wet cleaning bath was improved, based on the theoretical calculations and the water flow visualization. The detial of the water flow was pbserved when the wafers was operated in the bath.