[21a-C206-1~13] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

△ [21a-C206-2] Vapor phase chemical etching of silicon assisted by graphene oxide in combination with micro-contact printing

〇Wataru Kubota¹, Ryoya Yamaoka¹, Toru Utsunomiya¹, Takashi Ichii¹, Hiroyuki Sugimura¹ (1.Kyoto Univ.)

Keywords:assisted-etching, graphene oxide, catalyst

Chemical etching of silicon assisted by noble metals and carbon materials is drawing much attention and assisted etching in a vapor phase is focused as an alternative method for assisted etching in a liquid phase. We reported that graphene oxide (GO) works as the catalyst for silicon etching reaction in the vapor phase. In this report, we succeeded in site-selective chemical etching of silicon assisted by micro-patterned GO formed by micro-contact printing.