[21p-B203-1~20] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

▼ [21p-B203-17] Fabrication of conductive anatase Ti_1−xNb_xO₂ thin films by mist chemical vapor deposition

〇(D)Han XU¹, Tomohito Sudare¹, Yumie Miura¹, Ryo Nakayama¹, Ryota Shimizu¹, Naoomi Yamada², Kentaro Kaneko³, Taro Hitosugi^1,4 (1.Tokyo Tech., 2.Chubu Univ., 3.Kyoto Univ, 4.Univ. Tokyo)

Keywords:mist chemical vapor deposition, conductive Nb:TiO2

Niobium-doped anatase titanium dioxide (Ti_1−xNb_xO₂: TNO) thin films have gained much attention as a transparent conducting oxide. The deposition of TNO thin films have been mainly studied in vacuum physical vapor deposition. Herein, we alternatively applied mist chemical vapor deposition (mist-CVD) to the TNO thin films deposition, which is a high-throughput, scalable, cost-effective, and environmentally-friendly process. Although the fabrication of TNO thin films by mist-CVD have been reported, it is limited to highly toxic solvent toluene. In this study, we demonstrate that less toxic ethanol is effective on the fabrication of conductive TNO thin films.