[21p-C206-1~13] 7.1 X-ray technologies

▲ [21p-C206-5] Characteristics of the extreme ultraviolet spectrum from a laser produced plasma

〇Nozomi Tanaka¹, Yubo Wang¹, Katsunobu Nishihara¹, Shinsuke Fujioka¹, Atsushi Sunahara^1,2, Tomoyuki Johzaki^1,3, Kyung Sik Kang⁴, Youngduk Suh⁴, Jeong-Gil Kim⁴, Shinji Ueyama⁵, Ken Ozawa⁵ (1.ILE, Osaka Univ., 2.Purdue Univ., 3.Hiroshima Univ., 4.Samsung MR, 5.Samsung R&D Inst.)

Keywords:EUV source, Laser produced plasma, EUV spectrometory

Laser produced plasma (LPP) is known for its high-power radiation in short wavelength region ranging from extreme ultraviolet (EUV) to vacuum ultraviolet (VUV). Such high-power source enables us to expand materials processing application, such as photo-lithography or direct machining. The emission from the LPP source generally have a wide range of spectrum. understandings and optimization of the spectrum is one of the key control knobs for efficient use. This study aims to understand the characteristics of the plasma spectrum in EUV to VUV region, and suggest optimum source parameters for each of possible application