[21p-P16-1~15] 6.4 Thin films and New materials

[21p-P16-5] Femtosecond laser processing and cleaning of monolayer graphene membranes

〇Naohiro Kadoguchi^1,2, Tetsuro Kobayashi^1,2, Yuuki Uesugi^1,3, Yuichi Kozawa¹, Shunichi Sato¹ (1.IMRAM, Tohoku Univ., 2.Fac. Eng., Tohoku Univ., 3.PRESTO, JST)

Keywords:laser processing, femtosecond laser, graphene

In this session, we will introduce a new technology based on femtosecond laser thin-film processing that enables microfabrication of single-layer graphene films.
In addition, it is expected that low-intensity laser irradiation can remove contaminants from the surface of graphene films so that it is expected to be deployed as a new surface cleaning technology.
Details of the experimental system and the results of a detailed analysis of graphene films after removal of contaminants by femtosecond laser irradiation will be presented.