[22a-A202-1~9] 6.2 Carbon-based thin films

△ [22a-A202-8] Relationship between Injected Gas and DLC Deposition Rate on Gas-Injection Pulsed Plasma CVD Method

〇Hikaru Ohhra¹, Naoto Nagata¹, Takahiro Bando¹, Hirofumi Takikawa¹, Toru Harigai¹, Shinsuke Kunitsugu², Hidenobu Gonda³ (1.Toyohashi Univ. Technol., 2.Ind. Technol. Cent. Okayama Pref., 3.OSG Coating Service Co., Ltd.)

Keywords:DLC, Gas-Injection Pulsed Plasma CVD Method, High-Rate Deposition

Diamond-like carbon (DLC) film, which is a hard amorphous carbon film, is used a surface protective film for cutting tools. In this study, the gas state in gas-injection pulsed plasma CVD method is analyzed from fluid analysis by finite element method to clarify the relationship between gas state and high speed DLC deposition. Under the Ar flow rate of 1.12 m/s, the gas flow velocity at jetting was higher than under the Ar flow rate of 0.28 m/s, and the gas with a flow velocity reached the vicinity of the stage.