[22a-P04-1~14] 8 Plasma Electronics(Poster)

[22a-P04-8] Dependence formation time on SiO:CH films prepared with vinyl containing ingredients

〇Yuki Nakaizumi¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)

Keywords:CCP-CVD, SiO:CH, Superhydrophobic

We have been studying the deposition process of SiO:CH particles prepared by CVD method to form SiO:CH deposited films with surface microstructures. In this study, we aimed to clarify the change of the surface microstructure as a function of deposition time. Static contact angles showed that the surface microstructure of the deposited particles greatly enhanced the water repellency, which was attributed to the chemical bonding state of the particles.