[22p-P14-1~4] 13.6 Nanostructures, quantum phenomena, and nano quantum devices

[22p-P14-4] Micro/nano processing and surface cleaning of thin films using the near-threshold ultrafast laser ablation

〇Yuuki Uesugi^1,2, Taito Miwa¹, Naohiro Kadoguchi¹, Tetsuro Kobayashi¹, Yuichi Kozawa¹, Shunichi Sato¹, Koh Saitoh³ (1.Tohoku Univ., 2.PRESTO, JST, 3.Nagoya Univ.)

Keywords:thin film, laser processing, surface cleaning

Processing or cleaning of free-standing thin films with a thickness of < 100 nm is extremely difficult using conventional nanotechnology such as focused ion beam milling/etching. We have found that a laser processing method using ultrafast laser pulses of < 1 ps can treat even free-standing monoatomic layer materials. In the poster presentation, we will introduce our laser processing method and an example of the previous application of fabricating electron phase gratings for novel electron microscopy.