The 83rd JSAP Autumn Meeting 2022

Presentation information

Oral presentation

8 Plasma Electronics » 8.5 Plasma phenomena, emerging area of plasmas and their new applications

[23a-A307-1~5] 8.5 Plasma phenomena, emerging area of plasmas and their new applications

Fri. Sep 23, 2022 9:30 AM - 10:45 AM A307 (A307)

Keiichiro Urabe(Kyoto Univ.)

10:00 AM - 10:15 AM

[23a-A307-3] Optical Emission Spectroscopy in Pulse-Designed Deep Oscillation Magnetron Sputtering

Eisuke Yokoyama1, Tomoki Nagai1, Kaita Tsutsui1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshimo4, Fuminori Misaizu4 (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)

Keywords:pulsed sputtering, optical emission spectroscopy, deep oscillation magnetron sputtering

Deep oscillating magnetron sputtering (DOMS), which is performed using a comb-like pulsed power waveform, is a high-power pulsed magnetron sputtering with excellent arc-free characteristics for long pulses up to milliseconds. However, in the DOMS we have previously used, the amount of sputtered metal particle ions produced drops rapidly after the second-pulse discharge for the first-pulse discharge for micropulses. In this study, we investigated the maintenance of high ionization rate in the DOMS plasma by changing the On / Off time of the micropulses.