Hard X-ray Photoemission Spectroscopy Study on Interface Dipole Modulation Mechanism in Al2O3/TiOx/SiO2 MOS structure

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Fri. Sep 23, 2022 1:15 PM - 5:00 PM C102 (C102)

Takanobu Watanabe(Waseda Univ.), Koji Kita(Univ. of Tokyo)

2:30 PM - 2:45 PM

〇Yoshiharu Kirihara¹, Shunichi Ito¹, Akira Yasui², Noriyuki Miyata³, Hiroshi Nohira¹ (1.Tokyo City Univ., 2.JASRI, 3.AIST)

Keywords:Interface Dipole, Hard X-ray Photoemission Spectroscopy, MOS structures