[22a-P01-1~10] 1.3 Novel technologies and interdisciplinary engineering

[22a-P01-10] Evaluation of the sensitizing effect in positive type electron beam resist SML by oxygen plasma irradiation

〇Miho Fujimoto¹, Akihiro Matsutani¹ (1.Tokyo Tech.)

Keywords:electron beam lithography, plasma, SML

A positive-tone electron beam lithography resist known as SML has similar processing parameters to PMMA, but with enhanced performance. However, the sensitivity of SML is almost 5 times lower than that of ZEP resist. In this work, we study the sensitizing effect by oxgen plasma irradiation to the surface of SML resist to increase the sensitivity.