Improved crystallinity and physical properties of high-temperature ferromagnetic semiconductor GdO epitaxial thin films

Takato Fukasawa, Daichi Oka, Kenichi Kaminaga, Daichi Saito, Hirokazu Shimizu, Tomoteru Fukumura

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[23a-E204-1~10] 6.3 Oxide electronics

Wed. Mar 23, 2022 9:00 AM - 12:00 PM E204 (E204)

Kouhei Yoshimatsu(Tohoku Univ.), Yusuke Kozuka(NIMS)

11:45 AM - 12:00 PM

[23a-E204-10] Improved crystallinity and physical properties of high-temperature ferromagnetic semiconductor GdO epitaxial thin films

〇Takato Fukasawa¹, Daichi Oka¹, Kenichi Kaminaga², Daichi Saito¹, Hirokazu Shimizu¹, Tomoteru Fukumura^1,3,4,5 (1.Tohoku Univ., Sci., 2.Tohoku Univ., Eng., 3.Tohoku Univ., AIMR&CRC, 4.Tohoku Univ., CSIS, 5.Tohoku Univ., CSRN)

Keywords:ferromagnetic semiconductor, epitaxial thin film, pulsed laser deposition