[24a-E102-1~10] 17.3 Layered materials

[24a-E102-1] [The 51st Young Scientist Presentation Award Speech] Non-Classical Nucleation of Monolayer WS₂ revealed by In-situ Monitoring CVD

〇Yuta Iwamoto¹, Xiaoming Qiang¹, Toshiro Kaneko¹, Toshiaki Kato¹ (1.Tohoku Univ.)

Keywords:2D material, in-situ, growth mechanism

In this study, in-situ monitoring chemical vapor deposition (CVD) system has been developed to reveal the growth mechanism of tungsten disulfide (WS₂), known as an atomically thin layered material. Based on the systematic investigations, it was found that numerous liquid precursors diffuse on the substrate before the nucleation of TMD and form precursor puddle by aggreating each other. Then, monolayer TMD starts to grow from the precursor puddle at the initial growth stage. Further detailed image analysis revealed that the TMD growth follows the non-classical nucleation model in which nucleation occurs in two steps.