[24a-E202-1~10] 15.4 III-V-group nitride crystals

[24a-E202-1] Microstructural analysis of thick AlN films on NPSS by cross-sectional and plan-view TEM

〇Yudai Nakanishi¹, Takeaki Hamachi¹, Nakajima Yoshitaka², Yusuke Hayashi¹, Tetsuya Tohei¹, Shiyu Xiao³, Kanako Shojiki⁴, Hideto Miyake^4,5, Akira Sakai¹ (1.Grad. Sch. Eng. Sci., Osaka Univ., 2.INSD., Osaka Univ., 3.SPORR., Mie Univ., 4.Grad. Sch. Eng., Mie Univ., 5.Grad. Sch. RIS., Mie Univ.)

Keywords:Aluminum Nitride, DUVLED, UVCLED, NPSS

A variety of unique structures exist in AlN templates consisting of nano-patterned sapphire substrates (NPSS) and face-to-face annealed sputter-deposited AlN (FFA Sp-AlN). However, the relationship between these unique structures and the crystal quality is unclear, which is a barrier to the optimization of crystal fabrication conditions. In this study, we performed a detailed analysis of AlN deposited on two types of NPSS by TEM observation.