[24p-D316-1~11] 1.3 Novel technologies and interdisciplinary engineering

[24p-D316-4] Investigation for Silicon Photonic Waveguides Process using Al₂O₃ for Etching Mask

〇(B)Syouhei Lin¹, Yuuki Tsuji¹, Taegyu Woo¹, Joji Maeda¹, Taro Itatani², Takeru Amano² (1.Tokyo Univ. of Science, 2.AIST)

Keywords:Atomic Layer Deposition, Al2O3, Etching

We used Al₂O₃ by ALD (Atomic Layer Deposition) for an etching mask when use RIE (Reactive Ion Etching) for Silicon Photonic Waveguides, and high etching resistance was obtained.