[24p-E204-1~10] 6.2 Carbon-based thin films

△ [24p-E204-9] Ultra High-Rate Deposition and Film Quality Analysis of DLC Films Using Gas-Jet Plasma CVD Method with Ar/C₂H₂ Mixrd Gas

〇Hikaru Ohhra¹, Naoto Nagata¹, Takahiro Bando¹, Hirofumi Takikawa¹, Toru Harigai¹, Hidenobu Gonda², Shinsuke Kunitsugu³ (1.Toyohashi Univ. Technol., 2.OSG Coating Service Co., Ltd., 3.Ind. Technol. Cent. Okayama Pref.)

Keywords:DLC, Gas-Jet Plasma CVD Method, Ultra high-rate deposition

Diamond-like carbon (DLC) film, which is a hard amorphous carbon film, is used as a coating film for cutting tools because of its excellent mechanical properties. In this study, DLC is deposited by supplying Ar gas and C₂H₂ gas from the same gas-jet nozzle. The relationship between deposition rate and film quality with respect to gas flow rate is clarified. Ultra high-rate deposition rate of 2.2 µm/min was obtained by Gas-Jet Plasma CVD with Ar/C₂H₂ Mixed Gas. The raman spectra shape was not significantly different from that of DLC (hardness: 17GPa) obtained by Pulse-Arc-Plasma Jet CVD method with coaxial gas line.