1:45 PM - 2:00 PM
[24p-F308-2] Adsorption gas dependence of atomic layer etching of SiO2 by gas cluster ion beam
Keywords:Atomic layer etching, gas cluster ion beam
Presentation information
Oral presentation
CS Code-sharing session » 【CS.1】 Code-sharing Session of 2.3 & 7.5
[24p-F308-1~11] CS.1 Code-sharing Session of 2.3 & 7.5
Thu. Mar 24, 2022 1:30 PM - 4:30 PM F308 (F308)
Noriaki Toyoda(Univ. of Hyogo), Kousuke Moritani(兵庫県立大)