The 69th JSAP Spring Meeting 2022

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[25a-F307-1~8] 6.4 Thin films and New materials

Fri. Mar 25, 2022 9:15 AM - 11:30 AM F307 (F307)

Daichi Oka(Tohoku Univ. ), Hiroshi Takatsu(Kyoto Univ. )

10:30 AM - 10:45 AM

▲ [25a-F307-5] Epitaxial growth of Bi3O2S2Cl thin films with mist chemical vapor deposition

〇(M2)Zhengkang PENG1, Daichi Oka1, Tomoteru Fukumura1 (1.Tohoku Univ.)

Keywords:Epitaxial thin film, mist CVD, mixed anion compound