Poster presentation

[23p-P06-1~16] 6.4 Thin films and New materials

Wed. Mar 23, 2022 1:30 PM - 3:30 PM P06 (Poster)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 3:30 PM

[23p-P06-1] Systematic investigation on piezoelectric property of Mg and transitional element simultaneously added into AlN

〇Kenji Hirata¹, Hiroshi Yamada¹, Masato Uehara¹, Sri Ayu Anggraini¹, Morito Akiyama¹ (1.AIST)

1:30 PM - 3:30 PM

[23p-P06-2] Sputter epitaxy and characterization of Mn doped ITO films

〇Saiki Kitagawa¹, Ryoto Kawamura¹, Shintaro Takehisa¹, Toshihiro Nakamura^1,2 (1.Graduate School of Human and Environmental Studies, Kyoto Univ., 2.ILAS, Kyoto Univ.)

1:30 PM - 3:30 PM

[23p-P06-3] Growth of ZnSnN₂ layer by UHV sputter epitaxy method

〇Sotaro Mizuuchi¹, Shogo Terashita¹, Keisuke Yoshida¹, Shinoda Hiroyuki¹, Nobuki Mutsukura¹ (1.Tokyo Denki Univ.)

1:30 PM - 3:30 PM

[23p-P06-4] Composition Dependence of the Buffer Layer of the Magnetic Properties of the Non-equilibrium Phase Magnetic Garnet Thin Films

〇Kenta Mori¹, Takao Nishi¹, Takeshi Kato², Masami Kawahara³, Masami Nishikawa⁴, Takayuki Ishibashi⁴ (1.Kobe City Col. of Tech., 2.Nagaoka Univ. of Tech., 3.KOJUNDO CHEMICAL LAB., 4.Nagoya Univ.)

1:30 PM - 3:30 PM

[23p-P06-5] Effects of lattice strain on magnetic phase transition of FeRh alloy thin films

〇Masafumi Fukuzumi¹ (1.Hyogo Pref. Inst. Tech.)

1:30 PM - 3:30 PM

[23p-P06-6] A Study on Magnetotransport Measurements and Two-Band Model Analysis of Bismuth Films

〇Satoru Kitsunai¹, Jinya Kimura¹, Masamichi Sakai¹, Toshihiro Yoshizumi¹ (1.Saitama Univ.)

1:30 PM - 3:30 PM

[23p-P06-7] Characterization of two-dimensional oxide films exfoliated from Ga-based liquid metal alloys and their device applications

〇Naoki Maeda¹, Meguru Nagai¹, Taiki Tsutani¹, Takahito Imai¹, Shinichi Yamamoto¹ (1.Ryukoku Univ.)

1:30 PM - 3:30 PM

[23p-P06-8] Transfer and patterning of surface oxide films on Ga-based liquid metals

〇Taiki Tsutani¹, Meguru Nagai¹, Naoki Maeda¹, Shiniti Yamamoto¹ (1.Ryukoku Univ.)

1:30 PM - 3:30 PM

[23p-P06-9] Effect of Al Interlayer and Sputtering Gas on Properties of Very Thin Ag films

〇Hibiki Mori¹, Kotaro Ohkura¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹ (1.Kitami Inst of Tech)

1:30 PM - 3:30 PM

[23p-P06-10] Fabrication and characterization of black Al films deposited at different conditions

Yoshiki Maekawa¹, 〇Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Mikito Ueda², Martin Hruska³, Jan Kejzlar³, Premysl Fitl³ (1.Kitami Inst of Tech, 2.Hokkaido Univ, 3.UCT Prague)

1:30 PM - 3:30 PM

[23p-P06-11] Fabrication and characterization of black Ag films deposited at different conditions

〇Kazuto Takada¹, Midori Kawamura¹, Takayuki Kiba¹, Yoshio Abe¹, Mikito Ueda², Martin Hruska³, Jan Kejzlar³, Premysl Fitl³ (1.Kitami Inst. Tech, 2.Hokkaido Univ., 3.UCT Prague.)

1:30 PM - 3:30 PM

[23p-P06-12] Property Evaluations of Field-Effect Applied Pt Thin Films

〇(B)Ryo Tomita¹, Jinya Kimura², Satoru Kitsunai², Masamichi Sakai², Toshihiro Yoshizumi² (1.Eng. Saitama Univ., 2.Sci.Eng SaitamaUniv.)

1:30 PM - 3:30 PM

[23p-P06-13] Film thickness dependence of mechanical flexibility in amorphous B-doped In₂O₃ transparent conductive films

〇(M1)Shun Mori¹, Yukiya Ichinoseki¹, Kotaro Watanabe¹, Kaito Murano¹, Kaito Oe¹, Shinya Aikawa¹ (1.Kogakuin Univ.)

1:30 PM - 3:30 PM

[23p-P06-14] RT atomic layer deposition of SiO₂ and aluminum-silicate multiple layers and its application for ion sorption

〇Takeru Saito¹, Kentaro Saito^1,2, Masanori Miura³, Kensaku Kanomata³, Fumihiko Hirose¹ (1.Yamagata Univ., 2.JSPS Research Fellow, 3.ROEL Yamagata Univ.)

1:30 PM - 3:30 PM

[23p-P06-15] Crystal structure and binding states of In₂O₃:CaF₂ transparent conductive films

〇(M2)Kaito Oe¹, Nodera Ayumu¹, Mori Shun¹, Watanabe Kotaro¹, Aikawa Shinya¹ (1.Kogakuin Univ.)

1:30 PM - 3:30 PM

[23p-P06-16] Influence of Sputtering Pressure on Crystalline Property of YSZ Thin Films Deposited at Room-temperature by Reactive Sputtering

〇(M2)Jingyao Zhou¹, Susumu Horita¹ (1.JAIST)

Oral presentation

[24a-F307-1~8] 6.4 Thin films and New materials

Thu. Mar 24, 2022 9:15 AM - 11:30 AM F307 (F307)

Hiroaki Nishikawa(Kindai Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:15 AM - 9:30 AM

[24a-F307-1] Thermal Conductivity of Porous Magnesium Oxide Insulating Films Synthesized by Chelate Flame Deposition

〇Ruohui Xu¹, Keiji Komatsu¹, Atsushi Nakamura^1,2, Osamu Ito², Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Chubu Chelest)

9:30 AM - 9:45 AM

[24a-F307-2] Synthesis of zinc oxide micro-whiskers on activated carbon by atmospheric CVD method

〇YUKUN FAN¹, Keiji Komatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech.)

9:45 AM - 10:00 AM

[24a-F307-3] Soft X-ray emission spectroscopy analysis of amorphous carbon films formed by GCIB-assisted deposition

Reimi Miyamoto¹, Akio Nishiyama², Ryota Yoshikawa², Junji Taguchi², 〇Keiji Komatsu¹, Nobuo Saito¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.Nomura Plating Co., Ltd.)

10:00 AM - 10:15 AM

[24a-F307-4] Effects of sputtering with Kr gas and insertion of lowermost layer on electrical resistivity of Ag-multilayer

〇Koji Mizukoshi^1,2, Takafumi Yamamura³, Yasuhiro Tomioka³, Midori Kawamura¹ (1.Kitami Inst. of Tech., 2.YKK AP, 3.YKK)

10:30 AM - 10:45 AM

[24a-F307-5] Controlling interface magnetic coupling in L10-FeCo ordered alloy thin films
fabricated by the nitrogen surfactant effect

〇(B)Yoshitaka Umeda¹, Hiroki Ono¹, Kohei Yamamoto³, Osamu Ishiyama³, Toshihiko Yokoyama³, Masaki Mizuguchi^1,2, Toshio Miyamachi^1,2 (1.Nagoya Univ., 2.IMaSS, Nagoya Univ., 3.IMS)

10:45 AM - 11:00 AM

[24a-F307-6] N-O Co-Doped Sb2Te3 Phase-Change Material for High Performance Artificial Synaptic Device

〇Koji Niiyama¹, You Yin¹ (1.Gunma Univ.)

11:00 AM - 11:15 AM

[24a-F307-7] Porous TiO₂ layer formed by microwave heating technique under various atmospheres for dye-sensitized solar cell

〇Kyosuke Toda¹, Naoma Konishi¹, Kanta Naito¹, Masayuki Okuya¹ (1.Shizuoka Univ.)

11:15 AM - 11:30 AM

[24a-F307-8] Fabrication of c-axis Oriented Apatite Crystal Film on Ti Substrate

〇Taichi Muramoto¹, Hijiri Hashimoto¹, Takeshi Yamada², Masanobu Kusunoki² (1.Kindai Univ., Grad. Sch., 2.Kindai Univ.)

Oral presentation

[25a-F307-1~8] 6.4 Thin films and New materials

Fri. Mar 25, 2022 9:15 AM - 11:30 AM F307 (F307)

Daichi Oka(Tohoku Univ. ), Hiroshi Takatsu(Kyoto Univ. )

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:15 AM - 9:30 AM

[25a-F307-1] Preparation of phase-separated TiO₂-VO₂ films on glass substrates

〇Yuji Muraoka¹, Tadakuni Takeda², Takanori Wakita¹, Takayoshi Yokoya¹ (1.Okayama Univ. RIIS, 2.Okayama Univ.)

9:30 AM - 9:45 AM

[25a-F307-2] Fabrication of p-ch MoS₂ Thin FIlm Transistor and Improving the TFT performance by annealing

〇Kousaku Shimizu¹, Naoto Suzuki¹, Daichi Arai¹, Motoki Hanzawa¹ (1.Nihon Univ.)

9:45 AM - 10:00 AM

▲ [25a-F307-3] Nanostructure control of 2D van der Waals Materials α-MoO₃

〇(M1)Jiaqi YANG¹, Hitoshi Tabata¹, Hiroaki Matsui¹ (1.The University of Tokyo)

10:00 AM - 10:15 AM

▲ [25a-F307-4] Discovery of highly reduced oxide SrCoO₂ via electrochemical proton reduction and dehydration

〇Haobo Li^1,3, Shunsuke Kobayashi², Chengchao Zhong³, Morito Namba³, Yu Cao³, Daichi Kato³, Yoshinori Kotani⁴, Qianmei Lin³, Maokun Wu⁵, Wei-Hua Wang⁵, Masaki Kobayashi³, Koji Fujita³, Cedric Tassel³, Takahito Terashima³, Akihide Kuwabara², Yoji Kobayashi³, Hiroshi Takatsu³, Hiroshi Kageyama³ (1.Osaka Univ. SANKEN, 2.JFCC, 3.Kyoto Univ., 4.SPring-8, 5.Nankai Univ.)

10:30 AM - 10:45 AM

▲ [25a-F307-5] Epitaxial growth of Bi₃O₂S₂Cl thin films with mist chemical vapor deposition

〇(M2)Zhengkang PENG¹, Daichi Oka¹, Tomoteru Fukumura¹ (1.Tohoku Univ.)

10:45 AM - 11:00 AM

[25a-F307-6] Nitridation of Ga₂O₃ epitaxial thin film using melamine flow reduction-nitridation

〇Takahiko Kawaguchi¹, Yuka Shoji¹, Naonori Sakamoto¹, Hisao Suzuki¹, Naoki Wakiya¹ (1.Shizuoka Univ.)

11:00 AM - 11:15 AM

[25a-F307-7] Growth of thick α-Ga₂O₃ films

〇Takeru Wakamatsu¹, Hitoshi Takane¹, Kentaro Kaneko¹, Katsuhisa Tanaka¹ (1.Kyoto Univ.)

11:15 AM - 11:30 AM

[25a-F307-8] Thickness dependence of electrical conduction and optical property in LaH_x epitaxial thin films

〇Sumireno Uramoto¹, Hideyuki Kawasoko¹, Tomoteru Fukumura^1,2 (1.Tohoku Univ., 2.Tohoku Univ. WPI-AIMR&CRC)

Oral presentation

[25p-F307-1~16] 6.4 Thin films and New materials

Fri. Mar 25, 2022 1:30 PM - 6:00 PM F307 (F307)

Katsuhisa Tanaka(Kyoto Univ.), Tetsuo Tsuchiya(AIST)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:30 PM - 1:45 PM

△ [25p-F307-1] Heat Resistant Black Insulative Al-Doped Ag-Fe-O Thin Films For Touch Panel Displays

〇(DC)Mina Yamaguchi¹, Akihiro Ishii¹, Itaru Oikawa¹, Yusuke Yamazaki², Masaaki Imura², Hitoshi Takamura¹ (1.Tohoku Univ., 2.Nippon Electric Glass)

1:45 PM - 2:00 PM

▼ [25p-F307-2] Physical vapor deposition of conductive metal–organic framework thin film

〇(D)Seoungmin Chon¹, Ryo Nakayama¹, Shunta Iwamoto¹, Ryota Shimizu¹, Taro Hitosugi¹ (1.Tokyo Tech)

2:00 PM - 2:15 PM

△ [25p-F307-3] La_n+1Ni_nO_3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

〇Yuki Goto¹, Shohei Hisatomi¹, Tomoaki Oga¹, Satoru Kaneko^2,1, Mamoru Yoshimoto¹, Akifumi Matsuda¹ (1.TokyoTech, 2.KISTEC)

2:15 PM - 2:30 PM

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO₂
(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

〇(D)Kaidong Wang¹, Kazunori Nishio¹, Koji Horiba², Miho Kitamura², Kurei Edamura¹, Daisuke Imazeki¹, Ryo Nakayama¹, Ryota Shimizu¹, Hiroshi Kumigashira^2,3, Taro Hitosugi¹ (1.Tokyo Tech, 2.PF-KEK, 3.Tohoku Uni.)

2:30 PM - 2:45 PM

△ [25p-F307-5] Fabrication of La_1-xBa_xF_3-x epitaxial thin films using CF₄-assisted sputtering

〇Keisuke Fukatsu¹, Ryota Shimizu¹, Xin Dai¹, Shigeru Kobayashi¹, Kazunori Nishio¹, Taro Hitosugi¹ (1.Tokyo Tech)

2:45 PM - 3:00 PM

△ [25p-F307-6] Tunable Cr_1+δTe₂ films hosting skyrmion from frustrated ferrimagnetic background

〇Yuita Fujisawa¹, Markel Pardo-Almanza¹, Kohei Yamagami¹, C.H. Hsu², F.C. Chung², Yoshinori Okada¹ (1.OIST, 2.National Sun Yat-sen Univ.)

3:15 PM - 3:30 PM

△ [25p-F307-7] Film growth of perovskite hydride BaLiH₃ using infrared laser evaporation

〇(B)Erika Fukushi¹, Atsuo Kazama¹, Kota Munefusa¹, Hiroyuki Oguchi¹ (1.Shibaura Tech.)

3:30 PM - 3:45 PM

△ [25p-F307-8] Film growth of Group 1 and Group 2 Metal Hydrides using infraed laser deposition

〇(B)Kota Munefusa¹, Atsuo Kazama¹, Erika Fukushi¹, Hiroyuki Oguchi¹ (1.Shibaura Inst.)

3:45 PM - 4:00 PM

△ [25p-F307-9] Evaluation of LiBH₄ Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

〇(B)Kei Iwasaki¹, Keiichiro Iso¹, Atsuo Kazama¹, Hiroyuki Oguchi¹ (1.Shibaura Tech.)

4:00 PM - 4:15 PM

△ [25p-F307-10] Improvement in flatness of LiBH₄ films by substrate surface modification

〇(M1)Keiichiro Iso¹, Iwasaki Kei¹, Kazama Atsuo¹, Oguchi Hiroyuki¹ (1.Shibaura Inst.)

4:15 PM - 4:30 PM

△ [25p-F307-11] Film Growth of LiBH₄ Using Ionic Liquid-Mediated Method

〇(B)Takumi Tozawa¹, Atsuo Kazama¹, Shingo Maruyama², Yuji Matsumoto², Hiroyuki Oguhi¹ (1.Shibaura Tech., 2.Tohoku Univ.)

4:45 PM - 5:00 PM

△ [25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

〇(M2)Ziyang Cao¹, Ryoichiro Hayashi¹, Takuto Soma¹, Akira Ohtomo^1,2 (1.Tokyo Tech., 2.MCES.)

5:00 PM - 5:15 PM

▼ [25p-F307-13] Growth of Uniaxially Oriented Nickel Aluminum Superalloy Films for Spectroscopic Infrared Emitters

〇(D)PhuocToan Tran^1,2, Duc Thien Ngo^1,2, Tadaaki Nagao^1,2 (1.NIMS, 2.Hokkaido University)

5:15 PM - 5:30 PM

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO<sub>2 </sub>Optical Thin Films by Electron Beam and Sputtering Evaporation part3

〇(M1)Mutsuki Ito¹, Takayuki Matsudaira², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

5:30 PM - 5:45 PM

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

〇(M1)Hiroyasu Kato¹, Takayuki Matudaira², Hiroshi Murotani¹ (1.Grad.Sch.of Eng.,Tokai Univ., 2.SHINCRON Co.,Ltd)

5:45 PM - 6:00 PM

△ [25p-F307-16] Basic Research on the Application of CeO_²Films to Optical Sensors

〇(M2)Haruna Suzuki¹, Hiroshi Murotani¹ (1.Tokai Univ.)

Sessions

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[23p-P06-1~16] 6.4 Thin films and New materials

[24a-F307-1~8] 6.4 Thin films and New materials

[25a-F307-1~8] 6.4 Thin films and New materials

▲ [25a-F307-3] Nanostructure control of 2D van der Waals Materials α-MoO3

▲ [25a-F307-4] Discovery of highly reduced oxide SrCoO2 via electrochemical proton reduction and dehydration

▲ [25a-F307-5] Epitaxial growth of Bi3O2S2Cl thin films with mist chemical vapor deposition

[25p-F307-1~16] 6.4 Thin films and New materials

△ [25p-F307-1] Heat Resistant Black Insulative Al-Doped Ag-Fe-O Thin Films For Touch Panel Displays

▼ [25p-F307-2] Physical vapor deposition of conductive metal–organic framework thin film

△ [25p-F307-3] Lan+1NinO3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO2(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

△ [25p-F307-5] Fabrication of La1-xBaxF3-x epitaxial thin films using CF4-assisted sputtering

△ [25p-F307-6] Tunable Cr1+δTe2 films hosting skyrmion from frustrated ferrimagnetic background

△ [25p-F307-7] Film growth of perovskite hydride BaLiH3 using infrared laser evaporation

△ [25p-F307-8] Film growth of Group 1 and Group 2 Metal Hydrides using infraed laser deposition

△ [25p-F307-9] Evaluation of LiBH4 Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

△ [25p-F307-10] Improvement in flatness of LiBH4 films by substrate surface modification

△ [25p-F307-11] Film Growth of LiBH4 Using Ionic Liquid-Mediated Method

△ [25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

▼ [25p-F307-13] Growth of Uniaxially Oriented Nickel Aluminum Superalloy Films for Spectroscopic Infrared Emitters

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO<sub>2 </sub>Optical Thin Films by Electron Beam and Sputtering Evaporation part3

△ [25p-F307-15] Low Refractive Index Al2O3 Optical Thin Films by Sputtering andElectron Beam Evaporation

△ [25p-F307-16] Basic Research on the Application of CeO2 Films to Optical Sensors

Authenticate

▲ [25a-F307-3] Nanostructure control of 2D van der Waals Materials α-MoO₃

▲ [25a-F307-4] Discovery of highly reduced oxide SrCoO₂ via electrochemical proton reduction and dehydration

▲ [25a-F307-5] Epitaxial growth of Bi₃O₂S₂Cl thin films with mist chemical vapor deposition

△ [25p-F307-3] La_n+1Ni_nO_3n+1 epitaxial thin films synthesis by PLD method and effect of aliovalent doping effect

▼ [25p-F307-4] Epitaxial thin film synthesis of layered rocksalt high-entropy oxide LiMO₂
(M=1/6Cr, 1/6Mn, 1/6Fe, 1/6Co, 1/6Ni, and 1/6Cu)

△ [25p-F307-5] Fabrication of La_1-xBa_xF_3-x epitaxial thin films using CF₄-assisted sputtering

△ [25p-F307-6] Tunable Cr_1+δTe₂ films hosting skyrmion from frustrated ferrimagnetic background

△ [25p-F307-7] Film growth of perovskite hydride BaLiH₃ using infrared laser evaporation

△ [25p-F307-9] Evaluation of LiBH₄ Epitaxial Films Synthesized using Silicon as an IR absorber for Infrared Laser Evaporation

△ [25p-F307-10] Improvement in flatness of LiBH₄ films by substrate surface modification

△ [25p-F307-11] Film Growth of LiBH₄ Using Ionic Liquid-Mediated Method

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

△ [25p-F307-16] Basic Research on the Application of CeO_²Films to Optical Sensors