[25p-F307-1~16] 6.4 Thin films and New materials

△ [25p-F307-15] Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and
Electron Beam Evaporation

〇(M1)Hiroyasu Kato¹, Takayuki Matudaira², Hiroshi Murotani¹ (1.Grad.Sch.of Eng.,Tokai Univ., 2.SHINCRON Co.,Ltd)

Keywords:Low refractive index optical thin films, Alumina optical thin film, Combination deposition

In recent years, as electronic devices become more sophisticated, there is a need to improve the performance of optical components. In a previous study using the bisynthetic method developed in our laboratory, we succeeded in fabricating low refractive index optical thin films with practical mechanical strength different from conventional low refractive index films using the bisynthetic method. In this study, low refractive index Al2O3 optical thin films with a refractive index of about 1.56 were successfully deposited by simultaneous DC pulse sputtering and EB deposition using the biosynthetic method.