[25p-F307-1~16] 6.4 Thin films and New materials

△ [25p-F307-14] Hydrophilicity evaluation of low refractive index SiO₂Optical Thin Films by Electron Beam and Sputtering Evaporation part3

〇(M1)Mutsuki Ito¹, Takayuki Matsudaira², Hiroshi Murotani¹ (1.Tokai Univ., 2.SHINCRON Co.,Ltd.)

Keywords:optical thin film, hydrophilicity

In this laboratory, we have developed a biosynthetic method in which DC pulsed sputtering and EB deposition are operated simultaneously in the same vacuum vessel to deposit films continuously, and have succeeded in reducing the refractive index of SiO₂ optical thin films. In addition, previous studies have shown that the low refractive index SiO₂ films deposited by the Electron Beam and Sputtering Evaporation exhibit high hydrophilicity. In this study, we aim to evaluate the hydrophilicity of the low refractive index SiO₂-TiO₂ optical thin films deposited by the Electron Beam and Sputtering Evaporation.