The 69th JSAP Spring Meeting 2022

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[25p-F307-1~16] 6.4 Thin films and New materials

Fri. Mar 25, 2022 1:30 PM - 6:00 PM F307 (F307)

Katsuhisa Tanaka(Kyoto Univ.), Tetsuo Tsuchiya(AIST)

4:45 PM - 5:00 PM

[25p-F307-12] Thin-film growth and work-function characterizations of group IV transition-metal hydrides and nitrides

〇(M2)Ziyang Cao1, Ryoichiro Hayashi1, Takuto Soma1, Akira Ohtomo1,2 (1.Tokyo Tech., 2.MCES.)

Keywords:work function, Kelvin Probe Force Microscope, metal hydrides

Hydrogen, which is smaller than other elements, diffuses easily from the gas phase into the solid through the dissociation reaction from molecules to atoms. The purpose of this study was to directly estimate the extent to which the work function of metallic compounds is changed by the action of hydrogen. We focused on group IV transition metal elements (M = Ti, Zr, and Hf), which retain metallic conductivity even after anion exchange from hydrogen, and have confirmed a large difference in work function between hydrides and nitrides.