The 69th JSAP Spring Meeting 2022

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[25p-E104-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 25, 2022 1:00 PM - 6:30 PM E104 (E104)

Akihisa Ogino(Shizuoka Univ.), Toru Harigai(Toyohashi Univ. of Tech.)

3:45 PM - 4:00 PM

[25p-E104-11] Thin films of PTFE plasma polymers with recurring hydrophobic and hydrophilic properties

〇Kohshi Taguchi1, Mina Tomikawa1, Ko Minoura1, Motohiro Yamahara1, Kazuyuki Noborio1 (1.SAKIGAKE-Semiconductor Co., Ltd.)

Keywords:plasma polymer, Polytetrafluoroethylene, sputter

A plasma polymer was formed on a target of PTFE (Polytetrafluoroethylene), and changes in the characteristics of the sputtered film due to changes in the film forming conditions were observed. By observing the change in the contact angle of the sputtered film with time, we have found the conditions for forming a plasma polymer film that repeats water repellency and hydrophilicity. We will continue considering the characteristics of the PTFE plasma polymer thin film.