[25p-E104-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [25p-E104-14] Infrared Spectroscopy of Substrate Bias Effects on Film Deposition during Acetylene Plasm

〇(M1)Tatsuo Nakai¹, Atsuya Kuwada², Ryou Sasamoto², Masanori Shinohara², Takashi Matsumoto³, Satoshi Tanaka³ (1.Fukuoka Univ., 2.Fukuoka Univ., 3.Tokyo Electron Technology Solutions Co. Ltd.)

Keywords:amorphous carbon film, acetylene plasma, multiple-internal-reflection Infrared absorption spectroscopy

Amorphous carbon films have been used for industrial applications due to their useful properties such as chemical and mechanical stability, and their ability to be formed at low temperatures. The films have been deposited by plasma CVD using acetylene as source gas with feeding negatively bias to the substrate. Nowadays, atomic-order film deposition is required for medical and semiconductor applications. To do so, it is necessary to understand a film deposition mechanism at an atomic level. We investigated deposition reaction with in-situ infrared absorption spectroscopy; We will discuss a deposition model in this presentation.