Characterization of a-C:F films formed at low temperature on a copper substrate by low-energy electron irradiation on  c-C<sub>4</sub>F<sub>8</sub> condensed layer.

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 25, 2022 1:00 PM - 6:30 PM E104 (E104)

Akihisa Ogino(Shizuoka Univ.), Toru Harigai(Toyohashi Univ. of Tech.)

4:45 PM - 5:00 PM

〇(M1)Koki Akiyama¹, Tetsuya Sato¹ (1.Univ. of Yamanashi)

Keywords:plasma CVD, octafluorocyclobutane, fluorocarbon film