[25p-E305-1~18] 6.1 Ferroelectric thin films

[25p-E305-17] Direct Patterning of Ferroelectric Materials by Proton Beam Writing

〇Jun Hirade¹, Misa Yamasaki¹, Masaki Yamaguchi¹, Hideo Kimura² (1.Shibaura Inst. of Tech., 2.Yantai Univ.)

Keywords:Ferroelectricity, Proton Beam Writing, Next-generation Lithography Light Source

In this study, we investigated the direct patterning of ferroelectric films using a focused proton beam,
which is expected as a next-generation lithography light source.
It was confirmed that in a bismuth titanate thin film using a commercial EMOD solution,
drawing with a higher sensitivity than an EB with suppressed thermal effect can be realized.