The 69th JSAP Spring Meeting 2022

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Poster presentation

15 Crystal Engineering » 15.7 Crystal characterization, impurities and crystal defects

[25p-P06-1~5] 15.7 Crystal characterization, impurities and crystal defects

Fri. Mar 25, 2022 1:30 PM - 3:30 PM P06 (Poster)

1:30 PM - 3:30 PM

[25p-P06-2] Fabrication of heavily-doped Si layer for semiconductor based spin devices

〇Mizue Ishikawa1 (1.Nihon Univ. College of Engineering)

Keywords:spintronics, magnetoresistance