[26a-P05-1~5] 15.5 Group IV crystals and alloys

[26a-P05-2] Formation of Ultra-thin Nickel Silicide Layer on SiO₂/Si Substrate and Chemical Bonding Feature Analysis

〇(B)Keisuke Kimura¹, Shunsuke Nishimura², Noriyuki Taoka², Akio Ohta², Katsunori Makihara², Seiichi Miyazaki² (1.Nagoya Univ, 2.Grad Nagoya Univ)

Keywords:ultra thin films, XPS, NiSi